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When Can Nanoimprint Compete?: Process-Specific Total Cost, Yield Risk, and the Adoption of Canon Lithography Relative to ASML Deep-Ultraviolet Extreme-Ultraviolet

Name: When Can Nanoimprint Compete?: Process-Specific Total Cost, Yield Risk, and the Adoption of Canon Lithography Relative to ASML Deep-Ultraviolet Extreme-Ultraviolet
Brand: Independently Published
SKU: 2665690ca1ea1f5e9c58d1c9dfafa41d

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When Can Nanoimprint Compete?: Process-Specific Total Cost, Yield Risk, and the Adoption of Canon Lithography Relative to ASML Deep-Ultraviolet Extreme-Ultraviolet

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When Can Nanoimprint Compete?: Process-Specific Total Cost, Yield Risk, and the Adoption of Canon Lithography Relative to ASML Deep-Ultraviolet Extreme-Ultraviolet

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Märke	Independently Published
EAN	9798141164958

SPIE Press

Extreme Ultraviolet Lithography

871,17 kr

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LAP LAMBERT Academic Publishing

Extreme Ultraviolet Lithography: Second Edition

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Alphascript Publishing

Lithography: Photolithography, Stereolithography, Lithographic Limestone, Extreme ultraviolet lithography, X-ray Nanolithography, Interference Limestone

475,84 kr

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